Two factors in a manufacturing process for an integrated circuit are studied in a two-factor experiment. The purpose of the experiment is to learn their effect on the resistivity of the wafer. The factors are implant dose (2 levels) and furnace position (3 levels). Experimentation is costly so only one experimental run is made at each combination. The data are as follows.
Dose
Position
1
15.5
14.8
21.3
2
27.2
24.9
26.1
It is to be assumed that no interaction exists between these two factors.
(a) Write the model and explain terms.
(b) Show the analysis-of-variance table.
(c) Explain the 2 “error” degrees of freedom.
(d) Use Tukey’s test to do multiple-comparison tests on furnace position. Explain what the results show.
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